Research and development in micro-nanofabrication, optical and electrical characterization, bio-detection, and microelectronic and quantum devices for advanced technologies.
The 3IT.Nano platform is a unique ecosystem for micro-nanofabrication and characterization, providing 1,600 m² of state-of-the-art laboratories, including 530 m² of Class 100 clean rooms. Equipped with a versatile range of equipment, it offers a complete line of tools for material synthesis, micro- and nanofabrication as well as advanced characterization. Research conducted through the platform spans diverse and strategic fields: micro- and nanoelectronics, microelectromechanical systems (MEMS), photonics, renewable energy, power and high-frequency electronics, biosensing, lab-on-a-chip technologies and quantum devices. The platform is an open and collaborative infrastructure that accelerates the development of innovative technologies by bringing together researchers, students and industrial partners.
Services for partners from the post-secondary education sector and private industry:
- 200-mm and 100-mm micro- and nanofabrication process lines
- Thin film deposition
- Material growth
- Ion implantation
- Lithography (nanolithography, photolithography)
- Plasma etching (6 reactors)
- Wet etching
- Chemical processing
- Plating
- Chemical mechanical polishing (CMP)
- Direct wafer bonding
- Wafer dicing and thinning
- Automated wafer-scale metrology
- Advanced electrical characterization (alternating current (AC), direct current (DC), temperature-dependent, controlled atmosphere)
- Optical and photonic characterization
- Morphological and physical characterization (Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), X-ray diffraction, profilometry)
- Clean technology
- Energy
- Environmental technologies and related services
- Information and communication technologies and media
Specialized labs and equipment
| Equipment |
|---|
| SUSS MicroTec Mask Aligner MJB4 |
| OAI Model 200 Tabletop Mask Aligner |
| OAI Model 806MBA Mask Aligner |
| Applied Microengineering Ltd. AWB-04 Aligner Wafer Bonder |
| Allaremic 25X-1 Autoclave |
| Wet benches |
| MTI VGB-4A Vacuum Glove Box |
| Freiberg Instruments GmbH MDPspot measurement system |
| Centrifuges |
| Sun Electronic Systems Environmental Chamber EC12 |
| Angstrom Engineering Nebula Cluster system |
| Edwards AUTO 306 Vacuum Coater |
| Angstrom Engineering Quantum Series Physical Vapour Deposition System |
| Picosun R-200 Advanced Atomic Layer Deposition (ALD) System |
| SPS Polos ADC Automatic Resin Dispensing Cabinet |
| Rigaku SmartLab high-resolution X-ray diffractometer (XRD) |
| RAITH150TWO electron-beam lithography (EBL) system |
| RAITH EBPG 5200 e-beam lithography (EBL) system |
| Horiba UVISEL PLUS Spectroscopic Ellipsometer |
| J.A. Woollam alpha-SE Spectroscopic Ellipsometer |
| NuAire Biosafety Cabinet (Class II, Type A2) |
| OSEMI Epitaxy system for III-N materials (chemical beam epitaxy/CBE) |
| VG Semicon RIGER Epitaxy system for III-V materials (chemical beam epitaxy/CBE) |
| Equipment for epitaxy by chemical vapour deposition (CVD) for group IV materials |
| Solitec Engineering Ltd. Spin Coater |
| Brewer Science Cee 200X Precision Spin Coaters |
| OAI Model 2000 DUV-Flooder (distant ultraviolet) Exposure System |
| Filmetrics F10-RT-EXR Reflectometer |
| Carbolite furnace |
| Carbolite Gero HTCR6 High Temperature Clean Room Oven |
| Lindberg Blue M GO1310A-1 Gravity Oven |
| Jipelec JetFirst Rapid Thermal Annealing (RTA) furnace |
| Sentrotech Furnace |
| DZF-6050 ABE Vacuum Drying Oven |
| Tylan TYTAN Furnaces |
| Vulcan 3-550 Burnout Furnace |
| Oxford Instruments PlasmaPro 100 Cobra Reactive Ion Etching (RIE) system for etching of III-V materials |
| Oxford Instruments PlasmaPro 100 Cobra Inductively Coupled Plasma (ICP) etching system for metals |
| Oxford Instruments PlasmaPro 100 Estrelas Deep Reactive Ion Etching (DRIE) platform |
| Nordson March CS-1701 reactive ion etching (RIE) system |
| STS Multiplex inductively coupled plasma (ICP) SR III-V system |
| STS Multiplex Advanced Oxide Etching (AOE) inductively coupled plasma (ICP) system |
| STS Multiplex Advanced Silicon Etch (ASE-SR) inductively coupled plasma (ICP) system |
| VARIAN CF 3000 Ion Implanter |
| APOLLO Instruments S150-980-1/2C Infrared (IR) Laser (980 nm) |
| Quantronix Q-Mark Infrared (IR) Laser (1064 nm) |
| GSI Lumonics UV laser PM-846 ArF sn: E040002 193 nm |
| GSI Lumonics PulseMaster PM-846 UV excimer laser (248 nm) |
| AX-2000 Vacuum Mixer |
| Semilab LEI88 contactless electrical conductivity probe |
| Photon etc. hyperspectral imaging photoluminescence mapper (HIPLM) instrument (60mW) |
| CH Instruments Model 640C series Electrochemical Impedance Spectroscopy (EIS) instrument |
| Solartron Schlumberger Si 1260 Impedance/Gain-Phase Analyzer |
| Olympus IX-71-IX-2 1LL100 Fluorescence Microscope |
| Park Systems NX20 Atomic Force Microscope (AFM) |
| ThermoFisher Scientific Apreo2 Scanning Electron Microscope (SEM) |
| LyncéeTec DHM-1003 Digital Holographic Microscope |
| Keyence VK-X1100 3D Laser Scanning Confocal Microscope |
| Nikon Eclipse ME600L Industrial Microscope |
| Leica DM LM system microscope |
| ZEISS Infinity 2 Optical Microscope |
| ThermoFisher Scientific Axia ChemiSEM Scanning Electron Microscope |
| Thermo Scientific Phenom XL G2 Scanning Electron Microscope (SEM) |
| KRUSS DSA30S Drop Shape Analyzer |
| Novascan PSD-UVT Benchtop UV Cleaner |
| G&P Technology GNP-412S Wafer Cleaner |
| TEGAL Plasmaline 415 Plasma Asher |
| Philips PLM-150 photoluminescence (PL) mapping system |
| Heidelberg Instruments DWL 66fs Laser Lithography System |
| Alpsitec E460 CMP chemical mechanical polishing machine |
| ULTRA TEC MultiPol Polishing Maching |
| YES LP III Vapor Prime Oven |
| Fogale PHOTOMAP 3D White Light Interferometer |
| KLA Tencor P-17 Stylus Profiler |
| Veeco Dektak 150 surface profiler |
| Emitech K550 Automatic Sputter Coater and Sputtering System |
| Plasmionique SPT320 Sputter Deposition System |
| Edwards Auto 500 Sputtering System |
| STS MESC Multiplex plasma-enhanced chemical vapor deposition (PECVD) systems |
| Surface Plasmon Resonance (SPR) systems (3) |
| DISCO Corporation DAD-320 Dicing Saw |
| Semitool Rinse Dryer |
| Fourier transform infrared (FTIR) spectrometers (3) |
| Raman Spectrometer System with StellarNet Lab-LS-532 Raman laser |
| LED characterization station |
| Electrical measurements station including a Wentworth MP-400 probe station |
| Microcalorimetry station |
| MMR Technologies Hall effect station |
| Optical waveguide injection station |
| PV Measurements QEX7 External Quantum Efficiency (EQE) Measurement station |
| Sinton flash testing station |
| Phototransducer station |
| Wentworth MP-900 DC probe station |
| Ossila probe station |
| ScienTemp ultra-cold freezer |
| Ultrasonic Systems PRISM BT Benchtop Coating System |
Private and public sector research partners
• Institut Quantique
• Institut national d’optique (INO)
• Distriq, Quantum Innovation Zone
• Technum Québec, Microelectronics innovation zone
• MiQro Innovation Collaborative Centre (C2MI)
• CMC Microsystems
• Teledyne DALSA Bromont
• IBM Bromont
• Laser COMPONENTS Canada
• Umicore
• Nord Quantique
• Nokia
• Extropic
• Anyon Systems
• SBQuantum
• Opsens Inc.
• Irréversible Inc.
• AEPONYXDigitho
• Spectronix
• GaN Systems
• Excelitas Technologies Corp.
• The University of British Columbia
• McGill University
• University of Toronto
• University of Ottawa
• National Centre for Scientific Research (CNRS)
• École de technologie supérieure (ETS Montréal)
• Institut national de la recherche scientifique (INRS)
• Laval University
• National Research Council Canada (NRC) Edmonton
• Polytechnique Montréal